Welcome to the ForLab MagSens Center of Competence for research and development on high performance magnetic sensor systems!
ForLab MagSens is a joint center of Bielefeld University and Johannes Gutenberg-University Mainz. We are dedicated to
research for and development of new magnetic sensor systems that can measure position and angle of moving parts,
mechanical stress and many other quantities you want to detect. We offer an exceptional and stimulating research environment for tailoring the sensing systems to meet the requirements of
specific applications in automatisation, automotive, Industry 4.0 or biotechnology.
What can we do for your needs? The Center ForLab MagSens:
- pools the complete scientific and technical Know-How on the design, development and realization of magnetic stand-alone sensors and complete sensor systems.
- offers support and collaborations to create adapted high performance magnetic sensor systems for detection of position, angle, magnetic field or other quantities in applications
such as automatisation, automotive, compasses, material inspection and similar.
- covers the R & D requirements from the integration of new materials in thin film stacks for magnetic sensors, the analysis and optimization
of the sensing performance up to 8-inch wafer scale coating and lithography for demonstrators.
We use established as well as top-of-the-heap sensing principles:
- Ultrahigh Vacuum Sputtering for materials- thin film-development. Up to 16 sputtersources and wafer size from 2 inch to 8 inch.
- Molecular Beam Epitaxy for single crystalline thin film systems from up to 6 sources and up to 4 inch wafer size.
- Transport Characterization of resistance, magnetoresistance, tunneling resistance and Hall-effects with noise analysis under realistic conditions.
- Structural analysis of the sensor thin film stacks including their interfaces with Scanning- and Transmission-Electron microscopy, Atomic Force Microscopy, X-ray diffraction and
X-ray circular dichroism and X-ray Resonant Magnetic Reflectivity (at synchrotrons).
- Composition analysis of the film stacks by Energy Dispersive X-ray Analysis, X-ray Fluorescence and Scanning Auger Microscopy.