List of publications in peer reviewed journals in chronological order

List of publications in peer reviewed journals (1990 – 2004, chronological order)
Priv. Doz. Dr. U. Kleineberg, status April 2005

1.   Spin-polarized LEED from Xe-Pt(111)
G. Hilgers, U. Kleineberg, K. Nolting, S. Wirth, N. Müller, and U. Heinzmann
Vacuum 41 (1-3), pp. 325-327 (1990)

2.   Fabrication and characterization of Si-based soft x-ray mirrors
B. Schmiedeskamp, B. Heidemann, U. Kleineberg, A. Kloidt, M. Kühne, P. Müller, K. Nolting and U. Heinzmann
Proceedings SPIE 1343, pp. 64-72 (1990)

3.   Multischichten   für   optische   Komponenten   im   weichen Röntgengebiet
B Schmiedeskamp, T. Döhring, B. Heidemann, U. Kleineberg, A. Kloidt, H. Müller, K. Nolting und U. Heinzmann
VDI Verlag Dünnschichttechnologie '90 Bd. II, pp. 480-502

4.   Enhancement of the reflectivity of Mo/Si multilayer x-ray mirrors by thermal treatment
A. Kloidt, K. Nolting, U. Kleineberg, B. Schmiedeskamp, U. Heinzmann,P. Müller, M. Kühne
Appl. Phys. Lett. 58 (23), pp. 2601-2603 (1991)

5.   Multischichten   für   optische   Komponenten   im   weichen Röntgengebiet
B Schmiedeskamp, T. Döhring, B. Heidemann, U. Kleineberg, A. Kloidt, K. Nolting, M. Pröpper, H.-J. Stock, T. Tappe und U. Heinzmann
VDI Verlag Dünnschichttechnologie '92, pp. 329-336

6.   Large area soft X-ray projection lithography using multilayer mirrors structured by RIE
S. Rahn, A. Kloidt, U. Kleineberg, B. Schmiedeskamp, K. Kadel, W. K. Schomburg, J. Hormes, U. Heinzmann
Proceedings SPIE 1742, pp. 585-592 (1992)

7.   Fabrication, thermal stability and reflectivity measurements of   Mo/Si-multilayers as X-ray mirrors   and   other   optical components
A. Kloidt, H. J. Stock, U. Kleineberg, T. Döhring, M. Pröpper, K.   Nolting, B. Heidemann, T. Tappe, B. Schmiedeskamp, U. Heinzmann, M. Krumrey, P. Müller, F. Scholze, S. Rahn, J. Hormes, K. F. Heidemann
Proceedings SPIE 1742, pp. 593-603 (1992)

8.   Mo0.5Si0.5/Si multilayer soft x-ray mirrors, high thermal stability, and normal incidence reflectivity
H.-J. Stock, U. Kleineberg, A. Kloidt, B. Schmiedeskamp, U. Heinzmann, M. Krumrey, P. Müller, F. Scholze
Appl. Phys. Lett. 63 (16), pp. 2207-2209 (1993)

9.   Preparation and microstructure analysis of Mo/Si multilayers as x-ray optical components
A. Kloidt, H. J. Stock, U. Kleineberg, T. Döhring, M. Pröpper, S. Rahn, K. Hilgers, B. Heidemann, T. Tappe, B. Schmiedeskamp, U. Heinzmann
3S'93 Symposium on Surface Science, pp. 115-120, Kaprun/Austria May 9-15, 1993

10. Thermal Stability of Mo/Si Multilayer Soft X-Ray Mirrors Fabricated by Electron-Beam Evaporation
H.-J. Stock, U. Kleineberg, B. Heidemann, K. Hilgers, A. Kloidt, B. Schmiedeskamp, U. Heinzmann, M. Krumrey, P. Müller, F. Scholze
Appl. Phys. A58, pp. 371-376 (1994)

11. Smoothing of interfaces in ultrathin Mo/Si multilayers by ion bombardment
A. Kloidt, H. J. Stock, U. Kleineberg, T. Döhring, M. Pröpper, B. Schmiedeskamp, U. Heinzmann
Thin Solid Films 228, pp. 154-157 (1993)

12. Electron-beam-deposited Mo/Si and MoxSiy/Si multilayer x-ray mirrors and gratings
B. Schmiedeskamp, A. Kloidt, H.-J. Stock, U. Kleineberg, T. Döhring, M. Pröpper, S. Rahn, K. Hilgers, B. Heidemann, T. Tappe, U. Heinzmann, M. Krumrey, P. Müller, F. Scholze, K. F. Heidemann
Optical Engineering 33 (4), pp. 1314-1321 (1994)

13. Interface   Stability and Silicide Formation   in   High Temperature Stable MoxSi1-x/Si Multilayer Soft X-Ray Mirrors Studied by Means of X-Ray Diffraction and HRTEM
U. Kleineberg, H.-J. Stock, A. Kloidt, B. Schmiedeskamp, U. Heinzmann, S. Hopfe, R. Scholz
phys. stat. sol. (a) 145, pp. 539-550 (1994)

14. Multilayer Reflection Type Zone Plates and Blazed Gratings for the Normal Incidence Soft X-Ray Region
U. Kleineberg, H.-J. Stock, D. Menke, K. Osterried, B. Schmiedeskamp, U. Heinzmann, D. Fuchs, P. Müller, F. Scholze, K. F. Heidemann, B. Nelles, J. Thieme
Proceedings SPIE 2279, pp. 269-282 (1994)

15. Characterization of GaAs/AlAs Interfaces with   Silicon Interlayers
B. Schmiedeskamp, T. Tappe, B. Heidemann, J. Schlosser, G. Haindl, U. Kleineberg, T. Albers, M. Neumann
World Scientific (Singapore 1994)

16. Mo/Si-multilayer-coated ruled blaze gratings for the soft x-ray region
U. Kleineberg, K. Osterried, H.-J. Stock, D. Menke, B. Schmiedeskamp, D. Fuchs, P. Müller, F. Scholze, K. F. Heidemann, B. Nelles, U. Heinzmann
Appl. Optics 34 (28), pp. 6506-6512 (1995)

17. Mo/Si Multilayer Coated Laminar Phase and Ruled Blaze Gratings for the Soft X-Ray Region
U. Kleineberg, H.-J. Stock, A. Kloidt, K. Osterried, D. Menke, B. Schmiedeskamp, U. Heinzmann,    D. Fuchs, P. Müller, F. Scholze, G. Ulm, K. F. Heidemann, B. Nelles
J. Electr. Spectr. Rel. Phenom. 80, pp. 389-392 (1996)

18. Thermal stability of W1-xSix/Si multilayer   reflectivecoatings under high intensity excimer laser pulses
E. D`Anna, A. Luches, M. Martino, M. Brunel, E. Majkova, S. Luby, R. Senderak, M. Jergel, F. Hamelmann, U. Kleineberg, U. Heinzmann
Appl. Surf. Sci. 106, pp. 166-170 (1996)

19. Multilayer reflectors for polarization analysis of XUV radiation
D. Schulze, G. Sommerer, M. Drescher, J. Ludwig, U. Kleineberg, P.V. Nickles, U. Heinzmann, W. Sandner
X-Ray Lasers 1996, Int. Phys. Conf. Ser. No. 151, section 10
Eds. S. Svanders, C.-G. Walström, IOP publishing LTD, 1996

20.   Thermal stability of W1-xSix/Si multilayer under rapid thermal annealing
R Senderak, M. Jergel, S. Luby, E. Majkova, V. Holy, G. Haindl, F. Hamelmann, U. Kleineberg, U. Heinzmann
J. Appl. Phys. 81 (5) (1997)

21.   Carbon buffer layer for smoothing superpolished glass surfaces as substrates for Mo/Si multilayer soft x-ray mirrors
H.-J. Stock, F. Hamelmann, U. Kleineberg, D. Menke, B. Schmiedeskamp, K. Osterried, K.F. Heidemann, U. Heinzmann
Appl. Optics 36, (1997), pp. 1650-1652

22.   Efficiency of a multilayer-coated, ion-etched laminar holographic grating
in the 14.5 - 16.0-nm wavelength region
M.P. Kowalski, R.G. Cruddace, J.F. Seely, J.C. Rife, K.F. Heidemann, U. Heinzmann, U. Kleineberg, K. Osterried, D. Menke, W.R. Hunter
Optics Letters 22, (11), pp. 834-836 (1997)

23. Multilayer-coated laminar grating with 16% normal-incidence efficiency in the 150 A wavelength region
J.F. Seely, M.P. Kowalski, R.G. Cruddace, K.F. Heidemann, U. Heinzmann, U. Kleineberg, K. Osterried, D. Menke, J.C. Rife, W.R. Hunter
Applied Optics 36(31), pp. 8206-8213 (1997)

24.   Multilayer-coated soft x-ray diffraction gratings for synchrotron radiation applications
U.   Kleineberg, H.-J. Stock, D. Menke, O. Wehmeyer, U. Heinzmann, D. Fuchs, P. Bulicke, M. Wedowski, G. Ulm, K.F. Heidemann, K. Osterried
Proceedings SPIE 3150, pp. 18-30 (1997)

25. Characterization of the helical undulator HELIOS I in the 520 to 930 eV range
using a multilayer polarimeter
M. Drescher, G. Snell, U. Kleineberg, H.-J. Stock, N. Müller, U. Heinzmann, N.B. Brooks
Review of Scientific Instruments 68(5), pp. 1939-1944 (1997)

26. Polarization of the 61st harmonic form 1053 nm laser radiation in neon
D. Schulze, M. Dorr, G. Sommerer, J. Ludwig, P.V. Nickles, T. Schlegel, W. Sandner, M. Drescher, U. Kleineberg, U. Heinzmann
Physical Review A 57(4), pp. 3003-3007 (1998)

27.   Carbon/Titanium multilayer as soft x-ray mirrors for the water-window
H.-J. Stock, G. Haindl, F. Hamelmann, D. Menke, O. Wehmeyer, U. Kleineberg, U. Heinzmann, P. Bulicke, D. Fuchs, G. Ulm,
Applied Optics 37(25), pp. 6002-6005 (1998)

28. X-ray scattering study of interface roughness correlation in Mo/Si and Ti/C multilayers for X-UV optics
M. Jergel, V. Holy, E. Majkova, S. Luby, R. Senderak, H.-J. Stock, D. Menke, U. Kleineberg, U. Heinzmann
Physica B 253(1-2), pp. 28-39 (1998)

29. Chemical microanalysis by selected-area ESCA using an electron energy filter in a photoemission microscope
O. Schmidt, Ch. Ziethen, G.H. Fecher, , M. Merkel, M. Escher, D. Menke, U. Kleineberg, U. Heinzmann, G. Schönhense
Journal of Electron Spectroscopy and Related Phenomena 88-91, pp. 1009-1014 (1998)

30.   STM writing of artificial nanostructures in ultrathin PMMA and SAM resists and subsequent pattern transfer in a Mo/Si multilayer by Reactive Ion Etching
J. Hartwich, L. Dreeskornfeld, V. Heisig, S. Rahn, O. Wehmeyer, U. Kleineberg,
U. Heinzmann
Applied Physics A 66, pp. 685-688 (1998)

31.   Time-of-flight photoelectron emission microscopy TOF-PEEM : First results
H. Spiecker, O. Schmidt, Ch. Ziethen, D. Menke, U. Kleineberg, R.C. Ahuja, M. Merkel, U. Heinzmann, G. Schönhense
Nucl. Instrum. Meth. A 406(3), pp. 499-506 (1998)

32. STM writing Artificial Nanostructures in Alkanethiol-type Self-Assembled Monolayers
J. Hartwich, M. Sundermann, U. Kleineberg, U. Heinzmann
Appl. Surf. Sci 144-145, 538-542 (1999)

33. W/Si multilayers deposited by hot-filament MOCVD
F. Hamelmann, S.H.A. Petri, A. Klipp, G. Haindl, J. Hartwich, L. Dreeskornfeld, U. Kleineberg, P. Jutzi, U. Heinzmann
Thin Solid Films 338(1-2), pp 70-74 (1999)

34. Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy
L. Dreeskornfeld, R. Segler, G. Haindl, O. Wehmeyer, S. Rahn, E. Majkova, U. Kleineberg, U. Heinzmann, P. Hudek, I. Kostic,
Microelectronic Engineering 54, 303-314 (2000)

35. Photoemission Microscopy with Microspot-XPS by use of Undulator Radiation and a High-Throughput Multilayer Monochromator at BESSY
U. Kleineberg, D. Menke, F. Hamelmann, U. Heinzmann, O. Schmidt, G.H. Fecher, G. Schönhense
Journal of Electron Spectroscopy and Related Phenomena 101-103 (1999) pp. 931-936

36. Application of Reactive Ion Etching to the Fabrication of Microstructure on Mo/Si Multilayer
Zi-chun Le, L. Dreeskornfeld, S. Rahn, R. Segler, U. Kleineberg, U. Heinzmann
Chinese Physics Letters 16(9), pp. 665-666 (1999)

37. Comparison of mechanical ruled varied line spacing grating vs. laminar-type holographic grating for soft X-ray flat field spectrograph (short note)
T. Yamazaki, N. Miyata, Y. Harada, M. Yanagihara, E. Gullikson, S. Mrowka, U. Kleineberg, J. Underwood, K. Sano, M. Ishino, M. Koike
Applied Optics 38(19), pp. 4001-4003 (1999)

38. Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing,
S. Luby, M. Jergel, A. Anopchenko, A. Aschentrup, F. Hamelmann, E. Majkova, U. Kleineberg, U. Heinzmann,
Applied Surface Science 150(1-4), 178-184 (1999)

39. Lifetime studies of Mo/Si and Mo/Be multilayer coatings for extreme ultraviolet lithography
M. Wedowski, S. Bajt, J. A. Folta, E.M. Gullikson, U. Kleineberg, L.E. Klebanoff, M.E. Malinowski, W.M. Clift,
Proceedings SPIE 3767, 217-224 (1999)

40. Nanopatterning of Au absorber films on Mo/Si EUV multilayer mirrors by STM lithography in Self-Assembled Monolayers
M. Sundermann, J. Hartwich, K. Rott, D. Meiners, E. Majkova, U. Kleineberg, M. Grunze, U. Heinzmann
Surf. Science 454-456, 1104-1109 (2000)

41. In Situ Controlled Deposition of Thin Silicon Films by Hot-Filament MOCVD with (C5Me5)Si2H5 and (C5Me5)SiH3 as Silicon Precursors,
F. Hamelmann, A. Klipp, S.H.A. Petri, G. Haindl, J. Hartwich, U. Kleineberg, P. Jutzi, U. Heinzmann in:
N. Auner, J. Weis (Eds.), Organosilicon Chemistry - From Molecules to Materials IV, VCH Weinheim (Germany), 798 (1999).

42. Metal/Silicon Multilayers Produced by Low-Temperature MOCVD
F. Hamelmann, G. Haindl, J. Hartwich, A. Klipp, E. Majkova, U. Kleineberg, P. Jutzi, U, Heinzmann,
in : Properties and Processing of Vapor-Deposited Coatings (eds. M. Pickering, B.W. Sheldon, W.Y. Lee, R.N. Johnson), Mater. Res. Soc. Proc. 555, 19-24 (1999).

43. Pentamethylcyclopentadienyl Disilane as a Novel Precursor for the Chemical Vapor Deposition of Thin Silicon Films,
A. Klipp, F. Hamelmann, J. Hartwich, U. Kleineberg, P. Jutzi, U. Heinzmann,
Chemical Vapor Deposition 6(2), 63-66 (2000)

44. Metaloxide/Siliconoxide Multilayers with Smooth Interfaces Produced by in-situ Controlled Plasma-Enhanced MOCVD
F. Hamelmann, A. Klipp, G. Haindl, J. Schmalhorst, E. Majkova, U. Kleineberg, P. Jutzi, U. Heinzmann,
Thin Solid Films 358(1-2), 90-93 (2000)

45. Effect of ion-beam polishing on the interface quality in a Ti/C multilayer mirror for "water window"
M. Jergel, V. Holy, E. Majkova, S. Luby, R. Senderak, H.J. Stock, D. Menke, U. Kleineberg, U. Heinzmann,
Materials Science Forum 321-324, 184-190 (2000)

46. STM lithography in organic Self-Assembled Monolayer
U. Kleineberg, A. Brechling, M. Sundermann, U. Heinzmann,
Advanced Functional Materials 11(3), 208-212 (2001)

47. Microcharacterization of the surface oxidation of Py/Cu multilayers by scanning X-ray absorption spectromicrosocopy
U. Kleineberg, G. Haindl, A. Hütten, G. Reiss, E.M. Gullikson, M.S. Jones, S. Mrowka, S.B. Rekawa, J.H. Underwood, D.T. Attwood,
Applied Physics A 73(4), 515-519 (2001)

48. Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth
Y.C. Lim, T. Westerwalbesloh, A. Aschentrup, O. Wehmeyer, G. Haindl, U. Kleineberg, U. Heinzmann,
Applied Physics A 72 (1), 121-124 (2001)

49. Giant magnetoresistance of hysteresis-free Cu/Co-based multilayers
A. Hütten, T. Hempel, W. Schepper, U. Kleineberg, G. Reiss,
Journal of Magnetism and Magnetic Materials 226-230(2), 1758-1760 (2001)

50. Effect of substrate heating and ion beam polishing on the interface quality in Mo/Si multilayers-X-ray comparative study
A. Anopchenko, M. Jergel, E. Majkova, S. Luby, V. Holy, A. Aschentrup, I. Kolina, Y-C Lim, G. Haindl, U. Kleineberg, U. Heinzmann.
Physica B 305(1), 14-20 (2001)

51. Silicon oxide nanolayers for soft X-ray optics produced by plasma enhanced CVD
F. Hamelmann, A. Aschentrup, J. Schmalhorst, U. Kleineberg, U. Heinzmann, K. Dittmar, P. Jutzi.
Journale de Physique IV 11(3), 431-436 (2001)

52. Bufferlayer and caplayer engineering of Mo/Si EUVL multilayer mirrors
U. Kleineberg, T. Westerwalbesloh, O. Wehmeyer, M. Sundermann, A. Brechling, U. Heinzmann, M. Haidl, S. Müllender
Proceedings SPIE 4506, 113-120 (2001)

53. Sub-micron EUV Imaging using high harmonic radiation
M. Wieland, R. Frueke, Th. Wilhein, Ch. Spielmann, F. Krausz, M. Pohl, U. Kleineberg
Applied Physics Letters 81, 14-16 (2002)

54. Steering attosecond electron wave packets with light
R. Kienberger, M. Hentschel, M. Uiberacker, Ch. Spielmann, M. Kitzler, A. Scrinzi, M. Wieland, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, M. Drescher, F. Krausz.
Science 297, 144 (2002)

55. Time-resolved atomic inner-shell spectroscopy
M. Drescher, M. Hentschel, R. Kienberger, M. Uiberacker, V. Yakovlev, A. Scrinzi, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, F. Krausz.
Nature 419, 803 (2002)

56. Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing
U. Kleineberg, Th. Westerwalbesloh, W. Hachmann, U. Heinzmann, J.Tümmler, F. Scholze, G. Ulm, S. Müllender.
Thin Solid Films 433 (1-2), 230-236 (2003)

57. Characterization of DMPC bilayers and multilamellar islands on hydrophobic Self-Assembled Monolayers of ODS/Si(100) and mixed ODS-DDS/Si (100)
A. Brechling, M. Sundermann, U. Kleineberg, U. Heinzmann;
Thin Solid Films 433 (1-2), 281-286 (2003)

58. Determination of layer-thickness fluctuations in Mo/Si multilayers by cross-sectional HR-TEM and X-ray diffraction
A. Aschentrup, W. Hachmann, T. Westerwalbesloh, Y.C. Lim, U. Kleineberg, U. Heinzmann;
Appl. Phys. A 77 (5), 607-611 (2003)

59. Zone plate interferometry at 13 nm wavelength
M. Wieland, Th. Wilhein, Ch. Spielmann, U. Kleineberg.
Appl. Phys. B 76 (8), 885-889 (2003)

60. Transmission Photoelectron Microscopy of Diatoms at the Multilayer Monochromator Beamline U125-1/ML at BESSY II
M. Pohl, U. Kleineberg, U. Heinzmann;
AIP Conferenc Proceedings 705 ( Synchrotron Radiation Instrumentation San Francisco), 1360-1363 (2004)

61. Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask
L. Dreeskornfeld, G. Haindl, U. Kleineberg, U. Heinzmann, F. Shi, B. Volland, I.W. Rangelow, E. Majkova, Stefan Luby,   Kostic, L. Matay, P. Hrkut, P. Hudek, Hsin-Yi Lee;
Thin Solid Films 458 (1-2), 227-232 (2004)

62. Structural Organization of DMPC lipid layers on chemically micropatterned Self Assembled Monolayers as biomimetic systems
A.Brechling, M. Pohl, U. Kleineberg, U. Heinzmann;
Journal of Biotechnoogy 112 (1-2), 115-124 (2004)

63. Aperiodic nanometer multilayer systems as optical key components for attosecond electron spectroscopy
A.Wonisch, Th. Westerwalbesloh, W. Hachmann, N. Kabachnik, U. Kleineberg, U. Heinzmann;
Thin Solid Films 464-465, 473-477 ( 2004)

64. Atomic transient recorder
R. Kienberger, E. Goulielmakis, M. Uiberacker, A. Baltuska, V. Yakovlev, F. Bammer, A. Scrinzi, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, M. Drescher, F. Krausz.
Nature 427 (6977), 817-821 (2004)

65. Transmission Photoelectron Microscopy of Dry and Wet Biomaterials
M. Pohl, A. Oelsner, G. Schönhense, M. Möller, N. Hellmann, H. Decker, U. Kleineberg, U. Heinzmann.
Ultramicroscopy (in press 2004)

66. Direct measurement of light waves
E. Goulielmakis, M. Uiberacker, R. Kienberger, A. Baltuska, V. Yakovlev, A. Scrinzi, T. Westerwalbesloh, U. Kleineberg, U. Heinzmann, M. Drescher, F. Krausz.
Science 305 (5688), 1267-1269 (2004)

67. Time-resolved electron spectroscopy of atomic inner shell dynamics
M. Drescher, M. Hentschel, R. Kienberger, M. Uiberacker, T. Westerwalbesloh, U. Kleineberg, U. Heinzmann, F. Krausz.
Journal of Electron Spectroscopy and Related Phenomena 137-140, 259-264 (2004)

68. Aperiodic nanometer multilayer systems as optical key components for attosecond electron spectroscopy
A. Wonisch, T. Westerwalbesloh, W. Hachmann, N. Kabachnik, U. Kleineberg, U. Heinzmann
Thin Solid Films 464-465, 473-477 (2004)

69. Characterization and tests of planar Co3O4 model catalysts prepared by chemical vapour deposition
N. Bahlawane, EF. Rivera, K. Kohse-Hoinghaus, A. Brechling, U. Kleineberg.
Applied Catalysis B – Environmental 53 (4), 245 255 (2004)

70. Towards time-resolved soft x-ray microscopy using pulsed fs-high-harmonic radiation
M. Wieland, Ch. Spielmann, U. Kleineberg, Th. Westerwalbesloh, U. Heinzmann, T. Wilhein
Ultramicroscopy ( accepted 2004)

71. Reproducible generation and measurement of isolated sub-fs XUV pulses with phase-controlled few-cycle light
R. Kienberger, E. Goulielmakis, A. Baltuska, M. Uiberacker, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann, M. Drescher, F. Krausz
in "Ultrafast Optics IV" eds. F. Krausz et. al.; Springer, Series in Opt. Scien. Vol 95, p. 241 (2004)

72. Application of high-harmonic radiation for EUV interferometry and spectroscopy
M. Wieland, Ch. Spielmann, U. Kleineberg, U. Heinzmann, T. Wilhein
in "Ultrafast Optics IV" eds. F. Krausz et. al.; Springer, Series in Opt. Scien. Vol 95, p. 467 (2004)

73. Time-resolved inner-shell spectroscopy with sub-fs EUV pulses
M. Drescher, M. Hentschel, R. Kienberger, M. Uiberacker, V.Yakovlev, A. Scrinzi, Th. Westerwalbesloh, U. Kleineberg, U. Heinzmann and F. Krausz
in "Ultrafast Optics IV" eds. F. Krausz et. al. Springer, Series in Opt. Scien. Vol 95, p. 479 (2004)

74. Multilayer EUV Optics for Applications of Ultrashort High Harmonic Pulses
T. Westerwalbesloh, U. Kleineberg, Y.C. Lim, P. Siffalovic, M. Drescher and U. Heinzmann
in "Ultrafast Optics IV" eds. F. Krausz et. al. Springer, Series in Opt. Scien. Vol 95, p. 231 (2004)

75. High resolution actinic defect inspection for EUVL multilayer mask blanks by photoemission electron microscopy
U. Neuhäusler, A. Oelsner, M. Schicketanz, J. Slieh, N. Weber, M. Brzeska, A. Wonisch, T. Westerwalbesloh, H. Brückl, M. Escher, M. Merkel, G. Schönhense, U. Kleineberg and U. Heinzmann
Subm. to Appl. Phys. Lett. (2005)