Publikationsliste (list of publications):
PD Dr. Norbert Böwering

  1. N. Böwering, R. Sauerbrey, and H. Langhoff:
    "Kinetic studies of Ar2F* in electron-beam excited Ar-NF3 mixtures"
    J. Chem. Phys. 76, 3524-3528 (1982).
  2. N. Böwering, Chien-Yu Kuo, T.D. Raymond, and J.W. Keto:
    "Spectral Line Shapes from Two Photon Excitation of Xenon"
    in: Spectral Line Shapes Vol. II, (de Gruyter, Berlin, New York, 1983) p. 927-943.
  3. T.D. Raymond, N. Böwering, Chien-Yu Kuo, and J.W. Keto:
    "Two-photon laser spectroscopy of xenon collision pairs"
    Phys. Rev. A 29, 721-734 (1984).
  4. N. Böwering, T.D. Raymond, and J.W. Keto:
    "Enhanced quenching at reduced internuclear separations of xenon collision pairs"
    Phys. Rev. Lett. 52, 1880-1883 (1984).
  5. N. Böwering and J.W. Keto:
    "Selective quenching during half-collisions of laser excited xenon atoms"
    in: Proc. Int. Conf. on Lasers '84, W.C. Stwalley (editor) (STS Press, Washington, 1985).
  6. N. Böwering, M.R. Bruce, and J.W. Keto:
    "Collisional deactivation of two-photon laser excited xenon 5p56p. I. State-to-state reaction rates"
    J. Chem. Phys. 84, 709-714 (1986).
  7. N. Böwering, M.R. Bruce, and J.W. Keto:
    "Collisional deactivation of two-photon laser excited xenon 5p56p. II. Lifetimes and total quench rates"
    J. Chem. Phys. 84, 715-726 (1986).
  8. J.W. Keto and N. Böwering:
    "Observation of curve crossings in radiative collisions of xenon atoms"
    in: Advances in Laser Science I, American Institute of Physics, Conf. Proc. No. 146,
    W.C. Stwalley and M. Lapp (editors) (New York, 1986). p. 513-516.
  9. J.W. Keto and N. Böwering:
    "Observation of curve crossings in optical collisions of xenon atoms"
    in: Spectral Line Shapes, Vol. 4, R. J. Exton (editor) (A. Deepak Publishing, Hampton, Virginia, 1987) p. 235-249.
  10. M. Müller, F. Schäfers, N. Böwering, Ch. Heckenkamp, and U. Heinzmann:
    "Spin-Polarization Measurements in the Autoionization Region of Mercury"
    Physica Scripta 35, 459-462 (1987).
  11. T. Huth, A. Mank, N. Böwering, G. Schönhense, R. Wallenstein, and U. Heinzmann:
    "Photoelectron emission from HI using narrow-band, polarized, coherent VUV- radiation"
    in: Electronic and atomic collisions, H.B. Gilbody, W.R. Newell, F.H. Read, A.C.H. Smith (editors), (Elsevier Science, London, 1988) p. 607-612.
  12. A. Svensson, M. Müller, N. Böwering, U. Heinzmann, V. Radojevic, and W. Wijesundera:
    "Angle- and Spin-resolved photoelectron spectroscopy of the 4f subshell in atomic ytterbium"
    J. Phys. B: At. Mol. Opt. Phys. 21, L179-L185 (1988).
  13. N. Böwering, T. Huth, A. Mank, M. Müller, G. Schönhense, R. Wallenstein, and U. Heinzmann:
    "Photoelectron Spectroscopy of HI and Photoemission Following Narrowband VUV Excitation"
    in: Electron-Molecule Scattering and Photoionisation, Physics of Atoms and Molecules, P.G. Burke and J.B. West (editors), (Plenum Press, New York, London, 1988) p. 139-146.
  14. G. Fecher, M. Volkmer, B. Pawlitzky, N. Böwering and U. Heinzmann:
    "Sticking probability of oriented NO at Ni(100)"
    J. Chem. Soc. Faraday Trans. II 85, 1364-1367 (1989).
  15. A. Mank, M. Drescher, T. Huth-Fehre, G. Schönhense, N. Böwering and U. Heinzmann:
    "Angular distribution of photoelectrons ejected from HI by polarized coherent vuv radiation"
    J. Phys. B: At. Mol. Opt. Phys. 21, L487-L491 (1989).
  16. H. Lefebvre-Brion, M. Salzmann, H.-W. Klausing, M. Müller, N. Böwering and U. Heinzmann:
    "Influence of autoionisation and predissociation on the photoelectron parameters in HBr"
    J. Phys. B: At. Mol. Opt. Phys. 22, 3891-3900 (1989).
  17. M. Müller, N. Böwering, F. Schäfers and U. Heinzmann:
    "Spin-Resolved Photoionisation of Lead Above the Pb+(6s26p) 2P3/2 - Threshold"
    Physica Scripta 41, 38-41 (1990).
  18. M. Müller, N. Böwering, F. Schäfers and U. Heinzmann:
    "Photoelectron Spin-Polarisation Spectroscopy in the 5s5p2-Autoionisation Region of Indium"
    Physica Scripta 41, 42-46 (1990).
  19. T. Huth-Fehre, A. Mank, M. Drescher, N. Böwering and U. Heinzmann:
    "Rotationally Resolved Fano Effect of HI Molecules, An Experimental Study Using Coherent VUV Radiation"
    Phys. Rev. Lett. 64, 396-399 (1990).
  20. T. Huth-Fehre, A. Mank, M. Drescher, N. Böwering and U. Heinzmann:
    "A Laser-Based Coherent VUV Source and its Application to Highly Resolved Studies of the Fano Effect in HI"
    Physica Scripta 41, 454-457 (1990).
  21. N. Böwering, M. Salzmann, M. Müller, H.-W. Klausing and U. Heinzmann:
    "Photoelectron Spin Polarization approaching Unity: Photoionization of Tl"
    Physica Scripta 41, 429-432 (1990).
  22. G. H. Fecher, N. Böwering, M. Volkmer, B. Pawlitzky and U. Heinzmann:
    "Dependence of the sticking probability on initial molecular orientation: NO on Ni(100)"
    Surface Science Letters 230, L169-L172 (1990).
  23. G.H. Fecher, M. Volkmer, B. Pawlitzky, N. Böwering and U. Heinzmann:
    "Orientation Dependence of the Sticking Probability of NO at Ni(100)"
    Vacuum 41, 265-268 (1990).
  24. A. Mank, M. Drescher, T. Huth-Fehre, G. Schönhense, N. Böwering and U. Heinzmann:
    "Photoelectron Dynamics of HI ionized by Coherent VUV Radiation"
    J. Electron Spectroscopy and Related Phenomena 52, 661-670 (1990).
  25. M. Müller, N. Böwering, A. Svensson and U. Heinzmann:
    "Angle- and Spin-Resolved Photoelectron Spectroscopy in the Region of the 6s6p²-Autoionisation of Tl"
    J. Phys. B: At. Mol. Opt. Phys. 23, 2267-2275 (1990).
  26. C. Kerling, N. Böwering and U. Heinzmann:
    "Photoelectron angular distributions from laser-excited aligned Yb-atoms ionised by vacuum ultraviolet radiation"
    J. Phys. B: At. Mol. Opt. Phys. 23, L629-L635 (1990).
  27. N. Böwering, T. Döhring, U. Gärner and U. Heinzmann:
    "Spectral diagnosis of a laser-produced XUV-source using a digital camera system with pinhole-transmission grating"
    Laser Part. Beams 9, 593-601 (1991).
  28. A. Mank, M. Drescher, T. Huth-Fehre, N.Böwering, U. Heinzmann and H. Lefebvre-Brion:
    "Photoionization of jet-cooled HI with coherent VUV-radiation: Evidence for Hund's case (e)"
    J. Chem. Phys. 95, 1676-1687 (1991).
  29. N. Böwering, M. Müller, M. Salzmann and U. Heinzmann:
    "Angle-resolved measurements of the photoelectron spin polarisation in the photoionisation of HI molecules"
    J. Phys. B: At. Mol. Opt. Phys. 24, 4793-4801 (1991).
  30. N. Böwering, M. Salzmann, M. Müller, H.W. Klausing and U. Heinzmann:
    "Vibrationally resolved photoelectron-spin-polarization spectroscopy of HI molecules"
    Phys. Rev. A 45, R11-R14 (1992).
  31. N. Böwering, H.W. Klausing, M. Müller, M. Salzmann and U. Heinzmann:
    "Observation of vibrational excitation in photoelectron spectroscopy of HI 2Π"
    Chem. Phys. Lett. 189, 467-472 (1992).
  32. H. Müller, B. Dierks, F. Hamza, Z. Zagatta, G.H. Fecher, N. Böwering and U. Heinzmann:
    "Collision of oriented NO with Ni(100) and with oriented CO on Ni(100)"
    Surf. Sci. 269/270, 207-212 (1992).
  33. M. Volkmer, Ch. Meier, A. Mihill, M. Fink and N. Böwering:
    "Elastic Electron Scattering from CH3I Molecules Oriented in the Gas Phase"
    Phys. Rev. Lett. 68, 2289-2292 (1992).
  34. R. Kuntze, M. Salzmann, N. Böwering and U. Heinzmann:
    "Spin-resolved Auger Electron Spectroscopy of Barium Atoms"
    Phys. Rev. Lett. 70, 3716-3719 (1993).
  35. M. Drescher, A. Brockhinke, N. Böwering, U. Heinzmann and H. Lefebvre-Brion:
    "Rotationally resolved single-photon ionization of HCl and DCl"
    J. Chem. Phys. 99, 2300-2306 (1993).
  36. A. Mank, M. Drescher, A. Brockhinke, N. Böwering and U. Heinzmann:
    "Angle- and spin-resolved photoelectron spectroscopy in rotationally resolved photoionization of HI"
    Z. Phys. D 29, 275-289 (1994).
  37. H. Müller, G. Zagatta, N. Böwering and U. Heinzmann:
    "Orientation Dependence of NO Sticking and Scattering at Pt(100)"
    Chem. Phys. Lett. 223, 197-201 (1994).
  38. N. Böwering, M. Volkmer, Ch. Meier, J. Lieschke and M. Fink:
    "Electron diffraction from oriented molecules: e-CH3Cl"
    Z. Phys. D 30, 177-182 (1994).
  39. Ch. Meier, M. Volkmer, J. Lieschke, M. Fink and N. Böwering:
    "Intramolecular multiple scattering in electron diffraction from fluoro-methyl halides"
    Z. Phys. D 30, 183-187 (1994).
  40. R. Kuntze, M. Salzmann, N. Böwering and U. Heinzmann:
    "Spin polarization of Auger- and of photoelectrons from barium atoms exposed to circularly polarized radiation and their cross comparison"
    Z. Phys. D 30, 235-237 (1994).
  41. G. Zagatta, H. Müller, N. Böwering and U. Heinzmann:
    "Multimass thermal desorption spectroscopy as a monitoring device for chemical reaction products"
    Rev. Sci. Instrum. 65, 359-362 (1994).
  42. H. Müller, G. Zagatta, M. Brandt, O. Wehmeyer, N. Böwering, and U. Heinzmann:
    "Orientation dependent CO2 production by exposing a CO precovered Pt(100) surface to gas phase oriented NO"
    Surf. Sci. 307-309, 159-164 (1994).
  43. G. Zagatta, H. Müller, O. Wehmeyer, M. Brandt, N. Böwering and U. Heinzmann:
    "Quantitative mass analysis of N2, CO2 and N2O reaction products in the NO-CO reaction at Pt(100)"
    Surf. Sci. 307-309, 199-204 (1994).
  44. M. Salzmann, N. Böwering, H.-W. Klausing, R. Kuntze and U. Heinzmann:
    "Spin-resolved photoelectron spectroscopy of HBr in the resonance region of electronic autoionization"
    J. Phys. B: At. Mol. Opt. Phys. 27, 1981-1992 (1994).
  45. R. Kuntze, M. Salzmann, N. Böwering, U. Heinzmann, V.K. Ivanov, and N.M. Kabachnik:
    "Spin polarization spectroscopy of Auger- and photoelectrons in 5p ionization of barium atoms"
    Phys. Rev. A 50, 489-495 (1994).
  46. T. Döhring, J. Stiehler, N. Böwering and U. Heinzmann:
    "Soft x-ray spectrum of a laser-produced gallium plasma"
    J. Phys. B: At. Mol. Opt. Phys. 27, L663-L669 (1994).
  47. H. Müller, B. Dierks, G.H. Fecher, N. Böwering and U. Heinzmann:
    "Influence of orientation on coadsorption dynamics: CO displacement from a c(2x2) precovered Ni(100) surface by free oriented NO"
    J. Chem. Phys. 101, 7154-7160 (1994).
  48. M. Brandt, H. Müller, G. Zagatta, O. Wehmeyer, N. Böwering and U. Heinzmann:
    "Sticking and scattering of gas-phase oriented NO at Pt(100) as a function of the translational energy and of molecular orientation"
    Surf. Sci. 331-333, 30-34 (1995).
  49. N. Böwering, M. Volkmer, Ch. Meier, J. Lieschke, R. Dreier:
    "Electron Diffraction from Oriented Molecules and Implications for Molecular Structure Analysis"
    J. Mol. Struct. 348, 49-52 (1995).
  50. N. Müller, R. David, G. Snell, R. Kuntze, M. Drescher, N. Böwering, P. Stoppmanns, S.-W. Yu, U. Heinzmann, J. Viefhaus, U. Hergenhahn and U. Becker:
    "Spin resolved Auger electron spectroscopy after photoexcitation with circularly polarized radiation from the BESSY crossed undulator"
    J. Electr. Spectrosc. Rel. Phenom. 72, 187-193 (1995).
  51. M. Drescher, R. Irrgang, A. Elizarov, N. Böwering and U. Heinzmann:
    "Evidence for a molecule-rotation dependent spin polarization transfer mechanism in the photon-induced autoionization of HCl and DCl"
    Phys. Rev. Lett. 75, 2936-2939 (1995).
  52. M. Volkmer, Ch. Meier, J. Lieschke, A. Mihill, M. Fink and N. Böwering:
    "Dependence of the elastic electron differential cross section on molecular orientation: e-CH3I"
    Phys. Rev. A 53, 1457-1468 (1996).
  53. M. Salzmann, N. Böwering, H.-W. Klausing and U. Heinzmann:
    "Angle- and spin-resolved photoelectron spectroscopy of the pπ outer valence shell of HBr molecules"
    Z. Phys. D 36, 137-146 (1996).
  54. R. Kuntze, N. Böwering, M. Salzmann, U. Heinzmann and N.L.S. Martin:
    "Spin polarization of photoelectrons from zinc atoms in the 3d9 4s2 4p autoionization region"
    J. Phys. B: At. Mol. Opt. Phys. 29, 1025-1033 (1996).
  55. R. Kuntze, M. Salzmann, N. Böwering, U. Heinzmann, N.A. Cherepkov:
    "Photoionization of an open-shell atom with open-shell final ionic state: A spin-resolved study of photoelectrons above the Tl+(6s6p) 3P1 limit"
    J. Electr. Spectrosc. Rel. Phenom. 79, 335-338 (1996).
  56. R. Irrgang, N. Böwering, M. Drescher, M. Spieweck, U. Heinzmann:
    "High resolution single-photon ionization of HBr in the spin-orbit autoionization region"
    J. Chem. Phys. 104, 8966-8972 (1996).
  57. N. Böwering "Gas-phase electron scattering from free spatially oriented molecules"
    in: Selected Topics in Electron Physics (Proceedings of the Peter Farago Symposium), D.M. Campbell and H. Kleinpoppen (editors), (Plenum Press, New York, London, 1996) p. 193-203.
  58. M. Brandt, H. Müller, G. Zagatta, N. Böwering, U. Heinzmann:
    "Reaction of NO and CO on a Rh(100) surface studied with gas-phase oriented NO"
    Surf. Sci. 352-354, 290-294 (1996).
  59. M. Volkmer, Ch. Meier, J. Lieschke, R. Dreier, M. Fink and N. Böwering:
    "Azimuthal dependence of the differential cross section in electron scattering from free oriented CH3Cl molecules"
    Phys. Rev. A 56, R1690-R1693 (1997).
  60. M. Brandt, G. Zagatta, N. Böwering, and U. Heinzmann:
    "Reaction of NO and CO on a Pt(100) surface as a function of the NO translational energy and of molecular orientation"
    Surf. Sci. 385, 346-356 (1997).
  61. M. Brandt, T. Greber, N. Böwering, and U. Heinzmann:
    "The role of molecular state and orientation in harpooning reactions: N2O on Cs"
    Phys. Rev. Lett. 81, 2376-2379 (1998).
  62. M. Brandt, T. Greber, F. Kuhlmann, N. Böwering, and U. Heinzmann:
    "State and orientation dependent N2 emission in the N2O + Cs reaction"
    Surf. Sci. 402-404, 160-164 (1998).
  63. N. Böwering, "Electron Scattering from Free Oriented Molecules"
    in: Photonic, Electronic and Atomic Collisions, F. Aumayr and H.P. Winter, edts., (World Scientific, Singapore, 1998) p. 259-268.
  64. N. Böwering, M. Martins, G. Snell, R. Kuntze and U. Heinzmann:
    "Spin-resolved photoelectron spectroscopy in the autoionization region of atomic bismuth"
    J. Phys. B: At. Mol. Opt. Phys. 31, 5221-5232 (1998).
  65. M. Salzmann, M. Müller, N. Böwering and U. Heinzmann:
    "Photoelectron spin polarization in autoionization of NO molecules prepared by jet-cooling"
    J. Phys. B: At. Mol. Opt. Phys. 32, 2517-2528 (1999).
  66. M. Brandt, F. Kuhlmann, T. Gerber, N. Böwering and U. Heinzmann:
    "Interaction of gas-phase oriented N2O with lithium: evidence for an Eley-Rideal mechanism"
    Surf. Sci. 439, 49-58 (1999).
  67. N. Böwering, T. Lischke, B. Schmidtke, N. Müller, T. Khalil and U. Heinzmann:
    "Asymmetry in photoelectron emission from chiral molecules induced by circularly polarized light"
    Phys. Rev. Lett. 86, 1187-1190 (2001).
  68. N. Koch, D. Pop, R.L. Weber, N. Böwering, B. Winter, M. Wick, G. Leising, I.V. Hertel,
    W. Braun:
    "Radiation induced degradation and surface charging of organic thin films in ultraviolet photoemission spectroscopy"
    Thin Solid Films 391, 81-87 (2001).
  69. I.V. Fomenkov, W. N. Partlo, R.M. Ness, I.R. Oliver, S.T. Melnychuk, O.V. Khodykin, N.R. Böwering:
    "Optimization of a Dense Plasma Focus Device as a Light Source for EUV Lithography"
    in: Emerging Lithographic Technologies VI, Proc. SPIE Vol. 4688, 634-647 (2002).
  70. I.V. Fomenkov, R.M. Ness, I.R. Oliver, S.T. Melnychuk, O.V. Khodykin, N.R. Böwering, C.L. Rettig, J.R. Hoffman:
    "Performance and Scaling of a Dense Plasma Focus Light Source for EUV Lithography"
    in: Emerging Lithographic Technologies VII, Proc. SPIE Vol. 5037, 807-821 (2003).
  71. I.V. Fomenkov, R.M. Ness, I.R. Oliver, S.T. Melnychuk, O.V. Khodykin, N.R. Böwering, C.L. Rettig, J.R. Hoffman:
    "Performance and Scaling of a Dense Plasma Focus Light Source for EUV Lithography"
    in: SEMI Technology Symposium STS-ISM, Proc. SEMICON West2003, ISBN # 1-892568-78-0 (2003).
  72. N. Böwering, M. Martins, W.N. Partlo and I.V. Fomenkov:
    "Extreme ultraviolet emission spectra of highly ionized xenon and their comparison with model calculations"
    J. Appl. Phys. 95, 16-23 (2004).
  73. I.V. Fomenkov, R.M. Ness, I.R. Oliver, S.T. Melnychuk, O.V. Khodykin, N.R. Böwering, C.L. Rettig, J.R. Hoffman:
    "Performance and Scaling of a Dense Plasma Focus Light Source for EUV Lithography"
    in: Emerging Lithographic Technologies VIII, Proc. SPIE Vol. 5374, 168-182 (2004).
  74. T. Lischke, N. Böwering, B. Schmidtke, N. Müller, T. Khalil, and U. Heinzmann:
    "Circular dichroism in valence photoelectron spectroscopy of free unoriented chiral molecules: Camphor and bromocamphor"
    Phys. Rev. A 70, 022507-022519 (2004).
  75. I.V. Fomenkov, N. Böwering, C. L. Rettig, S.T. Melnychuk, I.R. Oliver, J.R. Hoffman, O.V. Khodykin, R.M. Ness, and W.N. Partlo:
    "EUV discharge light source based on a dense plasma focus operated with positive and negative polarity"
    J. Phys. D: Appl. Phys. 37, 3266-3276 (2004).
  76. J.R. Hoffman, A.N. Bykanov, O.V. Khodykin, A.I. Ershov, N. R. Böwering, I.V. Fomenkov., W.N. Partlo, D.W. Myers:
    "LPP EUV Conversion Efficiency Optimization"
    in: Emerging Lithographic Technologies IX, Proc. SPIE Vol. 5751, 892-901 (2005).
  77. C.L. Rettig, O.V. Khodykin, J.R. Hoffman, W.F. Marx, N. R. Böwering, E. Vargas, A.I. Ershov, I.V. Fomenkov., W.N. Partlo:
    "Protection of Collector Optics in an LPP Based EUV Source"
    in: Emerging Lithographic Technologies IX, Proc. SPIE Vol. 5751, 910-918 (2005).
  78. N.R. Böwering, J.R. Hoffman, O.V. Khodykin, C.L. Rettig, B.A.M. Hansson, A.I. Ershov, I.V. Fomenkov:
    "Metrology of laser-produced plasma light source for EUV lithography"
    in: Metrology, Inspection, and Process Control for Microlithography XIX, Proc. SPIE Vol. 5752, 1248-1256 (2005).
  79. I.V. Fomenkov, W. N. Partlo, N. R. Böwering, O.V. Khodykin, C.L. Rettig, R. N. Ness, J.R. Hoffman, I. R. Oliver, S.T. Melnychuk:
    "Dense Plasma Focus Source"
    Chapter 12 in EUV Sources for Lithography, Vivek Bakshi, Editor, SPIE Press, Bellingham, Washington USA, pp. 373-393 (2006).
  80. B. A. M. Hansson, I. V. Fomenkov, N. R. Böwering, A. I. Ershov, W. N. Partlo, D. W. Myers, O. V. Khodykin, A. N. Bykanov, C. L. Rettig, J. R. Hoffman, E. Vargas L., R. D. Simmons, J. A. Chavez, W. F. Marx, D. C. Brandt:
    "LPP EUV Source Development for HVM"
    in: Emerging Lithographic Technologies X, Proc. SPIE Vol. 6151, 61510R (2006).
  81. N. R. Böwering, A. I. Ershov, W. F. Marx, O.V. Khodykin, B. A. M. Hansson, E. Vargas L., J. A. Chavez, I. V. Fomenkov, D. W. Myers, D. C. Brandt:
    "EUV Source Collector"
    in: Emerging Lithographic Technologies X, Proc. SPIE Vol. 6151, 61513R (2006).
  82. I. V. Fomenkov, B. A. M. Hansson, N. R. Böwering, A. I. Ershov, W. N. Partlo, V. B. Fleurov, O.V. Khodykin, A. N. Bykanov, C. L. Rettig, J. R. Hoffman, E. Vargas L., J. A. Chavez, W. F. Marx, D. C. Brandt:
    "High Power Low Cost Drive Laser for LPP Source"
    in: Emerging Lithographic Technologies X, Proc. SPIE Vol. 6151, 61513X (2006).
  83. T. Feigl, S. Yulin, N. Benoit, N. Kaiser, N. R. Böwering, A. I. Ershov, O.V. Khodykin, J. W. Viatella, K. A. Bruzzone, I. V. Fomenkov, D. W. Myers:
    "High-Temperature LPP Collector Mirror"
    in: Emerging Lithographic Technologies X, Proc. SPIE Vol. 6151, 61514A (2006).
  84. D. C. Brandt, I. V. Fomenkov,, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. Vargas L., R. D. Simmons, J. A. Chavez, C. P. Chrobak:
    "LPP EUV Source Development for HVM"
    in: Emerging Lithographic Technologies XI, Proc. SPIE Vol. 6517, 65170Q, (2007).
  85. I. V. Fomenkov, D. C. Brandt, A. N. Bykanov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, E. Vargas L., R. D. Simmons, J. A. Chavez, C. P. Chrobak:
    "Laser-Produced Plasma Source System Development"
    in: Emerging Lithographic Technologies XI, Proc. SPIE Vol. 6517, 65173J, (2007).
  86. T. Feigl, S. Yulin, N. Benoit, M. Perske, M. Schürmann, N. Kaiser, N. R. Böwering, O.V. Khodykin I. V. Fomenkov, D. C. Brandt:
    "Enhanced Reflectivity and Stability of High-Temperature LPP Collector Mirrors"
    in: Advances in X-Ray/EUV Optics and Components III, Proc. SPIE Vol. 7077, 70771W, (2008).
  87. D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, G. O. Vaschenko, O. V. Khodykin, A. N. Bykanov, J. R. Hoffman, C. P. Chrobak, S. N. Srivastava, D. A. Vidusek, S. De Dea, R. R. Hou:
    "Laser-produced plasma source system development"
    in: Lithography Asia 2008, Proc. SPIE Vol. 7140, 71401E, (2008).
  88. Nigel Farrar, David Brandt, Norbert Böwering:
    "Optics for Scanning: Multilayer collector mirrors enable next-generation EUV Lithography"
    in: Laser Focus World 45(3), March 2009.
  89. D. C. Brandt, I. V. Fomenkov,, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, N. R. Farrar, G. O. Vaschenko, O. V. Khodykin, A. N. Bykanov, J. R. Hoffman, C. P. Chrobak, S. N. Srivastava, I. Ahmad, C. Rajyaguru, D. J. Golich, D. A. Vidusek, S. De Dea, R. R. Hou:
    "LPP Source System Development for HVM"
    in: Alternative Lithographic Technologies, Proc. SPIE Vol. 7271, 727103 (2009).
  90. I. V. Fomenkov, D. C. Brandt, A. N. Bykanov, A. I. Ershov, W. N. Partlo, D. W. Myers, N. R. Böwering, N. I. Farrar, G. O. Vaschenko, O. V. Khodykin, J. R. Hoffman, C. P. Chrobak, S. N. Srivastava, D. J. Golich, D. A. Vidusek, S. De Dea, R. R. Hou:
    "Laser-Produced Plasma Light Source for EUVL"
    in: Alternative Lithographic Technologies, Proc. SPIE Vol. 7271, 727138 (2009).
  91. Nigel R. Farrar, David C. Brandt, Igor V. Fomenkov, Alex I. Ershov, Norbert R. Bowering, William N. Partlo, David W. Myers, Alexander N. Bykanov, Georgiy O. Vaschenko, Oleh V. Khodykin, Jerzy R. Hoffman, Christopher P. Chrobak:
    "EUV laser produced plasma source development"
    Microelectronic Engineering 86, 509 - 512 (2009).
  92. Norbert R. Böwering, Igor V. Fomenkov, David C. Brandt, Alexander N. Bykanov, Alex I. Ershov, William N. Partlo, David W. Myers, Nigel I. Farrar, Georgiy O. Vaschenko, Oleh V. Khodykin, Jerzy R. Hoffman, Christopher P. Chrobak, Shailendra N. Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel J. Golich, David A. Vidusek, Silvia De Dea, Richard R. Hou:
    "Performance results of laser-produced plasma test and prototype light sources for EUV lithography"
    Journal of Micro/Nanolith. MEMS MOEMS 8(4), 041504 (2009).
  93. D. C. Brandt, I. V. Fomenkov,, A. I. Ershov, W. N. Partlo, D. W. Myers, R. L. Sandtrom, N. R. Böwering, G. O. Vaschenko, O. V. Khodykin, A. N. Bykanov, J. R. Hoffman, S. N. Srivastava, I. Ahmad, C. Rajyaguru, D. J. Golich, S. De Dea, R. R. Hou, K. M. O’ Brien, W. J. Dunstan:
    "LPP Source System Development for HVM"
    in: Extreme Ultraviolet (EUV) Lithography, Proc. SPIE Vol. 7636, 76361I (2010).
  94. I. V. Fomenkov,, A. I. Ershov, W. N. Partlo, D. W. Myers, R. L. Sandtrom, N. R. Böwering, G. O. Vaschenko, O. V. Khodykin, A. N. Bykanov, J. R. Hoffman, S. N. Srivastava, I. Ahmad, C. Rajyaguru, D. J. Golich, S. De Dea, R. R. Hou, K. M. O’ Brien, W. J. Dunstan, D. C. Brandt:
    "Laser Produced Plasma Light Source for EUVL"
    in: Extreme Ultraviolet (EUV) Lithography, Proc. SPIE Vol. 7636, 763639 (2010).
  95. D. C. Brandt, I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, R. L. Sandstrom, B. M. La Fontaine, M. J. Lercel, A. N. Bykanov, N. R. Böwering, G. O. Vaschenko, O. V. Khodykin, S. N. Srivastava, I. Ahmad, C. Rajyaguru, P. Das, V. B. Fleurov, K. Zhang, D. J. Golich, S. De Dea, R. R. Hou, W. J. Dunstan, C. J. Wittak, P. Baumgart, T. Ishihara, R. D. Simmons, R. N. Jacques, R. A. Bergstedt:
    "LPP Source System Development for HVM"
    in: Extreme Ultraviolet (EUV) Lithography II, Proc. SPIE Vol. 7969, 79691H (2011).
  96. I. V. Fomenkov, A. I. Ershov, W. N. Partlo, D. W. Myers, D. Brown, R. L. Sandstrom, B. La Fontaine, A. N. Bykanov, G. O. Vaschenko, O. V. Khodykin, N. R. Böwering, P. Das, V. B. Fleurov, K. Zhang, S. N. Srivastava, I. Ahmad, C. Rajyaguru, S. De Dea, R. R. Hou, W. J. Dunstan, P. Baumgart, T. Ishihara, R. D. Simmons, R. N. Jacques, R. A. Bergstedt, D. C. Brandt:
    "Laser Produced Plasma Light Source for EUVL"
    in: Extreme Ultraviolet (EUV) Lithography II, Proc. SPIE Vol. 7969, 796933 (2011).
  97. D. C. Brandt, I. V. Fomenkov, M. J. Lercel, B. M. La Fontaine, D. W. Myers, D. J. Brown, A. I. Ershov, R. L. Sandstrom, A. N. Bykanov, G. O. Vaschenko, N. R. Böwering, P. Das, V. B. Fleurov, K. Zhang, S. N. Srivastava, I. Ahmad, C. Rajyaguru, S. De Dea, W. J. Dunstan, P. Baumgart, T. Ishihara, R. D. Simmons, R. N. Jacques, R. A. Bergstedt, P. I. Porshnev, C. J. Wittak, M. R. Woolston, R. J. Rafac, J. Grava, A. A. Schafgans, Y. Tao:
    "Laser Produced Plasma EUV Sources for Device Development and HVM"
    in: Extreme Ultraviolet (EUV) Lithography III, Proc. SPIE Vol. 8322, 83221I (2012).
  98. I. V. Fomenkov, N. R. Böwering, D. C. Brandt, D. J. Brown, A. N. Bykanov, A. I. Ershov, B. La Fontaine, M. J. Lercel, D. W. Myers:
    "Light Sources for EUV Lithography at the 22nm Node and Beyond"
    in: Extreme Ultraviolet (EUV) Lithography III, Proc. SPIE Vol. 8322, 83222N (2012).
  99. T. Feigl, M. Perske, H. Pauer, T. Fiedler, S. Yulin, M. Trost, S. Schröder, A. Duparre, N. Kaiser, A. Tünnermann, N. R. Böwering, A. I. Ershov, K. Hoffmann, B. La Fontaine, K. D. Cummings:
    "Optical performance of LPP multilayer collector mirrors"
    in: Extreme Ultraviolet (EUV) Lithography III, Proc. SPIE Vol. 8322, 832217 (2012).
  100. I. V. Fomenkov, B. La Fontaine, D. Brown, I. Ahmad, P. Baumgart, N. R. Böwering, D. C. Brandt, A. N. Bykanov, S. De Dea, A. I. Ershov, N. R. Farrar, D. J. Golich, M. J. Lercel, D. W. Myers, C. Rajyaguru, S. N. Srivastava, Y. Tao, G. O. Vaschenko:
    "The development of stable EUV sources for use in lithography exposure systems"
    Journal of Micro/Nanolith. MEMS MOEMS 11 (2), 021110 (2012).
  101. T. Feigl, M. Perske, H. Pauer, T. Fiedler, S. Yulin, N. Kaiser, A. Tünnermann, N. R. Böwering, A. I. Ershov, S. De Dea, K. Hoffmann, B. La Fontaine, I. V. Fomenkov, D. C. Brandt:
    "Lifetime and refurbishment of multilayer LPP collector mirrors"
    in: Extreme Ultraviolet (EUV) Lithography IV, Proc. SPIE Vol. 8679, 86790C (2013).
  102. D. C. Brandt, I. V. Fomenkov, N. R. Farrar, B. La Fontaine, D. W. Myers, D. J. Brown, A. I. Ershov, R. L. Sandstrom, G. O. Vaschenko, N. R. Böwering, P. Das, V. B. Fleurov, K. Zhang, S. N. Srivastava, I. Ahmad, C. Rajyaguru, S. De Dea, W. J. Dunstan, P. Baumgart, T. Ishihara, R. D. Simmons, R. N. Jacques, R. A. Bergstedt, P. I. Porshnev, C. J. Wittak, R. J. Rafac, J. Grava, A. A. Schafgans, Y. Tao, K. Hoffmann, T. Ishikawa, D. R. Evans, S. D. Rich:
    "CO2/Sn LPP EUV sources for device development and HVM"
    in: Extreme Ultraviolet (EUV) Lithography IV, Proc. SPIE Vol. 8679, 86791G (2013).
  103. I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. La Fontaine, N. R. Böwering, D. J. Brown, A. I. Ershov, D. W. Myers:
    "Laser produced plasma EUV light source for EUVL patterning at 20 nm node and beyond"
    in: Extreme Ultraviolet (EUV) Lithography IV, Proc. SPIE Vol. 8679, 86792I (2013).
  104. D. C. Brandt, I. V. Fomenkov, N. R. Farrar, B. La Fontaine, D. W. Myers, D. J. Brown, A. I. Ershov, N. R. Böwering, D. J. Riggs, R. J. Rafac, S. De Dea, R. Peeters, H. Meiling, N. Harned, D. Smith, A. Pirati, R. Kazinczi:
    "LPP EUV source readiness for NXE 3300"
    in: Extreme Ultraviolet (EUV) Lithography V, Proc. SPIE Vol. 9048, 90480C (2014).
  105. I. V. Fomenkov, D. C. Brandt, N. R. Farrar, B. La Fontaine, D. W. Myers, D. J. Brown, A. I. Ershov, N. R. Böwering, D. J. Riggs, R. J. Rafac, R. Peeters, H. Meiling, N. Harned, D. Smith, R. Kazinczi, A. Pirati:
    "Laser produced plasma light source development for HVM"
    in: Extreme Ultraviolet (EUV) Lithography V, Proc. SPIE Vol. 9048, 904835 (2014).
  106. M. Trost, T. Herffurth, S. Schröder, A. Duparre, M. Beier, S. Risse, A. Tünnermann, N. Böwering:
    "In-situ and ex-situ characterization of optical surfaces by light scattering techniques"
    Opt. Eng. 53, 092013 (2014).
  107. A. A. Schafgans, D. J. Brown, I. V. Fomenkov, R. L. Sandstrom, A. I. Ershov, G. O. Vaschenko, R. J. Rafac, M. Purvis, S. Rokitski, D. J. Riggs, W. Dunstan, M. Graham, Y. Tao, N. R. Farrar, D. C. Brandt, N. Böwering, A. Pirati, N. Harned, C. Wagner, H. Meiling, R. Kool:
    "Performance optimization of MOPA prepulse LPP light source"
    in: Extreme Ultraviolet (EUV) Lithography VI, Proc. SPIE Vol. 9422, 94220B (2015).
Comments:
  1. N. Böwering:
    "Low-power UV Laser"
    Photonics Spectra, 38, 53 (2004).

Patents granted:

  1. G. Zagatta, H. Müller, N. Böwering, U. Heinzmann:
    "Meßanordnung und Meßverfahren zur Charakterisierung schneller chemischer Reaktionsabläufe",
    German Patent: Patentanmeldung (6/1993) und Patentschrift (8/1995) zu MMTDS, DE 4318626 C2
  2. N. Böwering:
    "Pulsbare Vorrichtung mit einer Anordnung zur Erzeugung von Strahlung sowie Verfahren zur Erzeugung von Strahlung ",
    European Patent: Patentanmeldung 27.06.2000
    published Jan. 02, 2002 EP 1168895
  3. S. T. Melnychuk, W. N. Partlo, I. V. Fomenkov, I. R. Oliver, R. M. Ness, N. Bowering, O. Khodykin:
    "Plasma focus light source with improved pulse power system"
    United States Patent No. US 6,815,700
    issued Nov. 9, 2004
  4. S. T. Melnychuk, W. N. Partlo, I. V. Fomenkov, I. R. Oliver, R. M. Ness, N. Bowering, O. Khodykin, C. L. Rettig, G. M. Blumenstock, T. S. Dyer, R. D. Simmons, J. R. Hoffman, R. M. Johnson:
    "Extreme ultraviolet light source"
    United States Patent No. US 6,972,421
    issued Dec. 6, 2005
  5. N. R. Bowering, B. A. M. Hansson, A. N. Bykanov, O. Khodykin, A. I. Ershov, W. N. Partlo:
    "Systems for protecting internal components of an EUV light source from plasma-generated debris"
    United States Patent No. US 7,109,503
    issued Sep. 19, 2006
  6. W. N. Partlo, N. R. Bowering, A. I. Ershov, I. V. Fomenkov, D. A. Myers, R. I. Oliver, J. Viatella, R. N. Jacques:
    "EUV light source"
    United States Patent No. US 7,164,144
    issued Jan. 16, 2007
  7. N. R. Bowering, A. I. Ershov, T. S. Dyer, H. R. Grinolds:
    "EUV light source optical elements"
    United States Patent No. US 7,193,228
    issued Mar. 20, 2007
  8. W. N. Partlo, J. M. Algots, G. M. Blumenstock, N. R. Bowering, A. I. Ershov, I. V. Fomenkov, X. Pan:
    "Collector for EUV light source"
    United States Patent No. US 7,217,940
    issued May. 15, 2007
  9. W. N. Partlo, N. R. Bowering, A. I. Ershov, I. V. Fomenkov:
    "Collector for EUV light source"
    United States Patent No. US 7,288,778
    issued Oct. 30, 2007
  10. I. V. Fomenkov, W. N. Partlo, G. M. Blumenstock, N. R. Bowering, I. R. Oliver, X. Pan, R. D. Simmons:
    "Discharge produced plasma EUV light source"
    United States Patent No. US 7,291,853
    issued Nov. 6, 2007
  11. N. R. Bowering:
    "Collector for EUV light source"
    United States Patent No. US 7,309,871
    issued Dec. 18, 2007
  12. I. R. Oliver, W. N. Partlo, I. V. Fomenkov, A. I. Ershov, N. Bowering, J. Viatella, D. W. Myers:
    "EUV light source"
    United States Patent No. US 7,323,703
    issued Jan. 29, 2008
  13. R. P. Akins, R. L. Sandstrom, W. N. Partlo, I. V. Fomenkov, T. D. Steiger, J. M. Algots, N. R. Bowering, R. N. Jacques, F. A. Palenschat, J. Song:
    "High repetition rate laser produced plasma EUV light source"
    United States Patent No. US 7,361,918
    issued Apr. 22, 2008
  14. N. Bowering, B. A. M. Hansson:
    "Systems for protecting internal components of a EUV light source from plasma-generated debris"
    United States Patent No. US 7,365,351
    issued Apr. 29, 2008
  15. S. T. Melnychuk, W. N. Partlo, I. V. Fomenkov, I. R. Oliver, R. M. Ness, N. R. Bowering, O. Khodykin, C. L. Rettig, G. M. Blumenstock, T. S. Dyer, R. D. Simmons, J. R. Hoffman, R. M. Johnson:
    "Extreme ultraviolet light source"
    United States Patent No. US 7,368,741
    issued May 6, 2008
  16. N. R. Bowering, J. R. Hoffman:
    "Systems and methods for EUV light source metrology"
    United States Patent No. US 7,394,083
    issued Jul. 1, 2008
  17. N. R. Bowering, B. A. M. Hansson, R. D. Simmons:
    "EUV light source"
    United States Patent No. US 7,453,077
    issued Nov. 18, 2008
  18. N. R. Bowering, O. V. Khodykin, A. N. Bykanov, I.V. Fomenkov:
    "Alternative fuels for EUV light source"
    United States Patent No. US 7,465,946
    issued Dec. 16, 2008
  19. N. Bowering:
    "High repetition rate laser produced plasma EUV light source"
    United States Patent No. US 7,525,111
    issued Apr. 28, 2009
  20. A.N. Bykanov, J.M. Algots, O.V. Khodykin, O. Hemberg, N.R. Bowering:
    "LPP EUV plasma source material target delivery system "
    United States Patent No. US 7,589,337
    issued Sep. 15, 2009
  21. A.I. Ershov, W.N. Partlo, N. Bowering, B. Hansson:
    "Laser produced plasma EUV light source"
    United States Patent No. US 7,598,509
    issued Oct. 6, 2009
  22. A.N. Bykanov, N. Bowering, I.V. Fomenkov, D.C. Brandt, A.I. Ershov, O. Khodykin, W.N. Partlo:
    "Laser produced plasma EUV light source"
    United States Patent No. US 7,671,349
    issued Mar. 2, 2010
  23. A.I. Ershov, W.F. Marx, N. Bowering, B.A.M. Hansson, O. Khodykin, I.V. Fomenkov:
    "Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source"
    United States Patent No. US 7,732,793
    issued Jun. 8, 2010
  24. N. R. Bowering:
    "EUV optics"
    United States Patent No. US 7,843,632
    issued Nov 30, 2010
  25. G.O. Vaschenko, A.N. Bykanov, N.R. Bowering, D.C. Brandt, A.I. Ershov, R.D. Simmons, O.V. Khodykin, I.V. Fomenkov:
    "Systems and methods for target material delivery in a laser produced plasma EUV light source"
    United States Patent No. US 7,872,245
    issued Jan. 18, 2011
  26. N. R. Bowering, O. V. Khodykin:
    "EUV light source components and methods for producing, using and refurbishing same"
    United States Patent No. US 7,906,701
    issued Jun 14, 2011
  27. A.N. Bykanov, N. Bowering, I.V. Fomenkov, A.I. Ershov, O.V. Khodykin:
    "Laser produced plasma EUV light source"
    United States Patent No. US 8,035,092
    issued Oct. 11, 2011
  28. Norbert R. Bowering, Juan Armando Chavez:
    "Systems and Methods for heating an EUV collector mirror"
    United States Patent No. US 8,198,612
    issued Jun 12, 2012
  29. N. R. Bowering, I. V. Fomenkov, O. V. Khodykin, A. N. Bykanov:
    "EUV light source components and methods for producing, using and refurbishing same"
    United States Patent No. US 8,314,398
    issued Nov. 20, 2012
  30. A. I. Ershov, I. V. Fomenkov, N. R. Bowering, J. R. Hoffman:
    "Drive laser for EUV light source"
    United States Patent No. US 8,514,486
    issued Aug. 20, 2013
  31. N. R. Bowering, I. V. Fomenkov:
    "EUV optics"
    United States Patent No. US 8,598,549
    issued Dec. 3, 2013
  32. N. R. Bowering, O. V. Khodykin:
    "EUV light source components and methods for producing, using and refurbishing same"
    United States Patent No. US 8,686,370
    issued Apr. 1, 2014
  33. N. R. Bowering, I. V. Fomenkov:
    "EUV optics"
    United States Patent No. US 8,907,310
    issued Dec. 9, 2014
ca. 10 patent applications submitted